Product Details
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GSL1100X-PJF-H combines an atmospheric plasma beam, a two dimensions automatic working stage, and a heating plate together, which allows the plasma beam to scan the sample surface according to the program setting and surface coating or treatment consistency and uniformity. The system consists of an RF generator, flexible gas delivery pipe, plasma beam head, the X-Y working stage, vacuum chuck sample holder, a programmable control box, heat plates, and a temperature control box. The plasma beam can activate and clean material surface rapidly at low temperature without vacuum, such as single crystal wafer, optical component, plastics, etc, It also makes plasma-enhanced CVD film on the substrate via a mixture of chemical gas under atmospheric pressure.
SPECIFICATIONS
Input Power for Plasma | 208 V - 240VAC, 50/60 Hz, < 1000W |
RF Generator |
Output Frequency: 20-23 kHz, 25KV (click picture below - left to see detailed specs) Plasma Beam Head: Round head: 10-12mm |
Input Gas Pressure and Working Gases |
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Plasma Working Pressure | 7- 10 PSI |
Working Environment |
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& Controller |
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Heating Plate |
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Dimensions & Net Weight |
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Warranty & Certificate |
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Operation Instructions |
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Application Notes |
Please click the link to learn more about the AP-PECVD application: . |
Option Part |
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